The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2026
Filed:
Dec. 22, 2023
Semes Co., Ltd., Cheonan-si, KR;
SEMES CO., LTD., Cheonan-si, KR;
Abstract
Provided is a substrate processing apparatus including a chamber including an inner space, a fluid supply unit configured to supply a supercritical fluid to the inner space, a fluid exhaust unit configured to exhaust the supercritical fluid from the inner space, and a controller configured to control the fluid supply unit and the fluid exhaust unit, wherein the fluid supply unit includes a fluid supply source, a supply line connecting the fluid supply source and the chamber to each other, a flow rate control valve installed in the supply line, and a flow rate measuring member installed in the supply line and positioned between the fluid supply source and the flow rate control valve, and the controller is further configured to control the flow rate control valve to supply the supercritical fluid, based on a flow rate of the supercritical fluid measured by the flow rate measuring member.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile