The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2026
Filed:
Jan. 09, 2024
Applicant:
Lacework, Inc., Mountain View, CA (US);
Inventors:
Jay Parikh, Redwood City, CA (US);
Yijou Chen, Cupertino, CA (US);
Assignee:
Fortinet, Inc., Sunnyvale, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/9038 (2019.01); G06F 9/455 (2018.01); G06F 9/54 (2006.01); G06F 16/901 (2019.01); G06F 16/9535 (2019.01); G06F 16/9537 (2019.01); G06F 21/57 (2013.01); H04L 9/40 (2022.01); H04L 43/045 (2022.01); H04L 43/06 (2022.01); H04L 67/306 (2022.01); H04L 67/50 (2022.01); G06F 16/2455 (2019.01);
U.S. Cl.
CPC ...
H04L 63/1425 (2013.01); G06F 9/455 (2013.01); G06F 9/545 (2013.01); G06F 16/9024 (2019.01); G06F 16/9038 (2019.01); G06F 16/9535 (2019.01); G06F 16/9537 (2019.01); G06F 21/57 (2013.01); H04L 43/045 (2013.01); H04L 43/06 (2013.01); H04L 63/10 (2013.01); H04L 67/306 (2013.01); H04L 67/535 (2022.05); G06F 16/2456 (2019.01);
Abstract
Methods, systems, and products for alert generation and augmentation using a large language model ('LLM'), including: providing, to the LLM, information describing a monitored deployment; providing, to the LLM, information describing one or more alerts associated with the monitored deployment; and receiving, from the LLM, an enhanced alert, wherein the enhanced alert is based at least in part on at least one of the information describing the monitored deployment and the information describing one or more alerts associated with the monitored deployment.