The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2026

Filed:

Apr. 07, 2021
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Masayoshi Yoshioka, Tokyo, JP;

Naoki Sakamoto, Tokyo, JP;

Shinya Kitayama, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/18 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/185 (2013.01); H01J 37/261 (2013.01); H01J 2237/317 (2013.01);
Abstract

A charged particle beam deviceincludes analysis means performed by a controller when a sample holder HL holding a sample SAM is installed on a stage. The analysis means includes a step (a) of raising a degree of vacuum of each of an observation chamberand a preprocessing chamberby opening a gate valve VL, opening a valve VL, closing a valve VL, and driving a vacuum pump, a step (b) of closing the gate valve VLand opening the valve VLafter the step (a), and a step (c) of processing the sample SAM by radiating an ion beam from an ion sourceto the sample SAM while performing vacuum exhaust of the preprocessing chamberby the vacuum pumpafter the step (b). The analysis means can process the sample SAM quickly after performing the vacuum exhaust of the preprocessing chamberin a short time.


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