The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2026

Filed:

Mar. 21, 2024
Applicant:

Contemporary Amperex Technology (Hong Kong) Limited, Hong Kong, CN;

Inventors:

Xiaosong Liu, Ningde, CN;

Keqiang Li, Ningde, CN;

Zhiyang Wu, Ningde, CN;

Yi Lu, Ningde, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70808 (2013.01); G03F 7/2002 (2013.01); G03F 7/2032 (2013.01); G03F 7/7005 (2013.01); G03F 7/7055 (2013.01); G03F 7/70733 (2013.01);
Abstract

An exposure apparatus includes a conveying mechanism and an exposure mechanism. The conveying mechanism is configured to convey a substrate, a surface of the substrate being coated with photoresist. The exposure mechanism includes an exposure source and an exposure member. The exposure source is configured to provide light to the substrate. The exposure member includes an exposure section opposite the substrate, where the exposure section is located between the exposure source and the substrate and disposed in close proximity to the substrate, the exposure section has a light-transmitting portion that allows light to be incident on the substrate and a light-shielding portion that prevents light from being incident on the substrate, and the exposure section is configured to keep the light-transmitting portion and the light-shielding portion in synchronized movement with the substrate.


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