The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2026
Filed:
Mar. 03, 2022
Fuji Corporation, Chiryu, JP;
Yoshitaka Hashimoto, Kariya, JP;
Ryojiro Tominaga, Okazaki, JP;
FUJI CORPORATION, Chiryu, JP;
Abstract
A shaping method and a shaping device to reduce an influence of a raised portion of a semi-cured layer on an upper layer. The shaping method repeatedly executes a first discharging step, a first flattening step, and a first curing step to form a first flattening layer on a stage. A second discharging step and the semi-curing step are repeatedly executed to form a semi-cured layer on the stage. A third discharging step discharges the first curable viscous fluid onto the smooth layer, a third flattening step flattening the first curable viscous fluid discharged in the third discharging step, by the flattening member, by increasing the number of scans of flattening by the flattening member to be larger than that in the first flattening step, and a third curing step of curing the first curable viscous fluid flattened in the third flattening step.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile