The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2026

Filed:

Jan. 16, 2023
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Jun Young Choi, Cheongju-si, KR;

Gui Su Park, Cheonan-si, KR;

Young Hun Lee, Cheonan-si, KR;

Young Jin Jang, Cheonan-si, KR;

Jun Hyun Lim, Seoul, KR;

Assignee:

SEMES CO., LTD., Cheonan-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 3/10 (2006.01); B08B 3/04 (2006.01); B08B 3/08 (2006.01); B08B 3/10 (2006.01);
U.S. Cl.
CPC ...
B05C 3/10 (2013.01); B08B 3/041 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01);
Abstract

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a batch-type treating bath for treating a substrate in a batch-type manner; a single-type treating chamber for treating the substrate in a single-type manner; and a buffer chamber positioned on a transfer path of the substrate transferred between the batch-type treating bath and the single-type treating chamber, and supplying a liquid for maintaining a wetting state of the substrate.


Find Patent Forward Citations

Choi, Jun. (2026). Buffer chamber, substrate treating apparatus and substrate treating method (U.S. Patent No. 12649164). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12649164

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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