The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2026
Filed:
Feb. 26, 2021
Societe DE Commercialisation Des Produits DE LA Recherche Appliquée Socpra Sciences ET Genie S.e.c., Sherbrooke, CA;
Jean-François Dufault, Sherbrooke, CA;
Mathieu Picard, Sherbrooke, CA;
Luc Frechette, Sherbrooke, CA;
Dino Mehanovic, Sherbrooke, CA;
Jean-François Peloquin, Sherbrooke, CA;
Paul Bruno Sylvain Camus, Annemasse, FR;
Nadi Braidy, Sherbrooke, CA;
Abstract
A micro-reactor for a reforming process has a cold side and a hot side opposite the cold side. Inlets are defined in the cold side, the inlets configured for receiving reagents. An outlet is defined in the cold side, the outlet configured for exiting reforming products. A reforming chamber is in the hot side, the reforming chamber having a catalyst, the reforming chamber configured for reforming the reagents into the reforming products, the reforming chamber including channels extending toward an end surface on the hot side of the reforming chamber, and a return plenum. A reagent path is from the inlets to the reforming chamber, the reagent path configured to feed the plurality of channels with reagents. A reforming product path is from the reforming chamber to the outlet, the reforming product path configured to receive products from the return plenum.