The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2026
Filed:
Aug. 24, 2022
Topcon Corporation, Tokyo, JP;
Akira Takahashi, Tokyo, JP;
Kazuhiro Yamada, Tokyo, JP;
TOPCON CORPORATION, Tokyo, JP;
Abstract
An ophthalmic apparatus includes an illumination optical system, an optical scanner, an imaging optical system, a controller, and an image forming unit. The illumination optical system is configured to generate slit-shaped illumination light. The optical scanner is configured to deflect the illumination light to guide the illumination light to a fundus of a subject's eye. The imaging optical system is configured to guide returning light of the illumination light from the fundus to an image sensor. The controller is configured to control the optical scanner. The image forming unit is configured to form an image of the fundus based on a light receiving result captured in an imaging target region on a light receiving surface of the image sensor. The image sensor is configured to capture the light receiving result in an opening region on the light receiving surface using a rolling shutter method, the opening region corresponding to an illumination region of the illumination light on the fundus, the illumination region being moved in a predetermined scan direction by the optical scanner. The controller is configured to control the optical scanner so that irradiation times of the returning light at a plurality of light receiving elements in the imaging target region are substantially equal.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile