The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2026

Filed:

Sep. 28, 2023
Applicant:

Ngk Insulators, Ltd., Nagoya-City, JP;

Inventors:

Tatsuya Kuno, Nagoya-City, JP;

Taro Usami, Kakamigahara-City, JP;

Assignee:

NGK INSULATORS, LTD., Nagoya, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 72/10 (2026.01); H01J 37/32 (2006.01); H10P 72/00 (2026.01); H10P 72/72 (2026.01); H10P 72/76 (2026.01);
U.S. Cl.
CPC ...
H10P 72/127 (2026.01); H01J 37/3244 (2013.01); H01J 37/32724 (2013.01); H10P 72/0602 (2026.01); H10P 72/722 (2026.01); H10P 72/7624 (2026.01);
Abstract

A wafer placement table includes: a ceramic plate having a wafer placement surface, a cooling plate having a refrigerant flow path and being provided on a lower surface-side of the ceramic plate; a first ceramic plate penetration section that reaches the wafer placement surface; a second ceramic plate penetration section that reaches the wafer placement surface; a first gas passage that communicates with the first ceramic plate penetration section; and a second gas passage that communicates with the second ceramic plate penetration section. The first gas passage has a first gas intermediate passage, the second gas passage has a second gas intermediate passage, the second gas intermediate passage is provided above the first gas intermediate passage, and the refrigerant flow path has a first flow path section provided above the first gas intermediate passage, and a second flow path section provided below the second gas intermediate passage.


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