The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2026
Filed:
Sep. 24, 2021
Lam Research Corporation, Fremont, CA (US);
Thadeous Bamford, Portland, OR (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A gas distribution arrangement to provide gas mixtures to processing stations in a substrate processing system comprises a first and second valve inlet blocks to supply first and second precursor gas mixtures. The first valve inlet block is arranged above the processing stations and comprises a first housing that encloses a first plurality of valves in fluid communication with the processing stations and a first precursor gas manifold, a first co-flow gas manifold, and a first divert outlet manifold in fluid communication with the first plurality of valves. The second valve inlet block is arranged above the first valve inlet block and comprises a second housing that encloses a second plurality of valves in fluid communication with the processing stations and a second precursor gas manifold, a second co-flow gas manifold, and a second divert outlet manifold in fluid communication with the second plurality of valves.