The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2026

Filed:

May. 16, 2023
Applicant:

Magnolia White Corporation, Tokyo, JP;

Inventors:

Hirofumi Mizukoshi, Tokyo, JP;

Kaichi Fukuda, Tokyo, JP;

Takanobu Takenaka, Tokyo, JP;

Masaru Takayama, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10K 71/60 (2023.01); C23C 14/06 (2006.01); C23C 14/14 (2006.01); C23C 14/24 (2006.01); C23C 14/50 (2006.01); H10K 59/12 (2023.01); H10K 59/122 (2023.01); H10K 59/80 (2023.01); H10K 102/20 (2023.01);
U.S. Cl.
CPC ...
H10K 59/1201 (2023.02); C23C 14/0694 (2013.01); C23C 14/14 (2013.01); C23C 14/24 (2013.01); C23C 14/505 (2013.01); H10K 71/60 (2023.02); H10K 59/122 (2023.02); H10K 59/8052 (2023.02); H10K 59/873 (2023.02); H10K 2102/20 (2023.02);
Abstract

According to one embodiment, a manufacturing method of a display device includes preparing a processing substrate, forming an organic layer, and forming an etching stopper layer on the organic layer. The forming the etching stopper layer includes carrying the processing substrate into a chamber, inside the chamber, emitting a material for forming the etching stopper layer from an evaporation source which inclines with respect to a normal of the processing substrate, and conveying the processing substrate while rotating the processing substrate in a plane orthogonal to the normal, and depositing the material emitted from the evaporation source on the processing substrate.


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