The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2026

Filed:

Dec. 21, 2023
Applicant:

Jpmorgan Chase Bank, N.a., New York, NY (US);

Inventors:

Ankur Sand, Cambridge, GB;

Martin J Grant, Middletown, DE (US);

Luca Baggio, London, GB;

Danny Su, Bath, GB;

Danica Dometita, Ladenburg, PA (US);

Nicholas Campbell, Singapore, SG;

Ken K. Wilson, Millington, NJ (US);

Dawn David-Swan, Elmont, NY (US);

David R. Edwards, Tokyo, JP;

Syed Islam, London, GB;

Assignee:

JPMORGAN CHASE BANK, N.A., New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04L 9/40 (2022.01);
U.S. Cl.
CPC ...
H04L 63/1433 (2013.01);
Abstract

In one example, a non-transitory computer-readable storage medium stores executable program instructions that detect, at a remote device node, vulnerability data associated with an exploitable vulnerability of a target enterprise network; retrieve, by a first local device node, the vulnerability data, which may include a CVSS score, determine, by a second local device node, a vulnerability score Vby determining a first subscore V, where the first subscore Vis based on a Maximized Confidentiality Impact (MCI) metric that is a modified privacy metric to capture the privacy impact of the exploitable vulnerability, where the first subscore Vis also based on a Maximized Highest Impact (MHI) metric to capture reputation damage based on an outsized single impact attribute, and on a Modified Confidentiality (MC) metric, Modified Integrity (MI) metric and Modified Availability (MA) as provided by CVSS; and remediate the exploitable vulnerability based on the vulnerability score V.


Find Patent Forward Citations

Sand, Ankur. (2026). Vulnerability scoring based on organization-specific metrics (U.S. Patent No. 12647443). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12647443

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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