The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2026
Filed:
Feb. 12, 2024
Applicant:
Kayaku Advanced Materials, Inc., Westborough, MA (US);
Inventors:
W. Shannan O'shaughnessy, Lincoln, MA (US);
Sergio Fernandez, Somerville, MA (US);
Andrew Grant, Lexington, MA (US);
Lucas Black, Boston, MA (US);
Assignee:
Kayaku Advanced Materials, Inc., Westborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/40 (2006.01); C23C 16/505 (2006.01); H01J 37/063 (2006.01);
U.S. Cl.
CPC ...
H01J 37/063 (2013.01); C23C 16/401 (2013.01); C23C 16/505 (2013.01); H01J 37/32449 (2013.01);
Abstract
Plasma-enhanced chemical vapor deposition (PECVD) reactors and methods of fabricating polymers via PECVD processes are generally provided. In some embodiments, a PECVD reactor has one or more features that enhance the quality of the polymers that may be formed therein. Similarly, some methods are performed in a manner that enhances the quality of a polymer formed thereby.