logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12645142 B1

PDFFull Text
Date of Patent:
Jun. 02, 2026

Filed:

Jun. 17, 2019

Photoresist composition, a method for manufacturing a photoresist coating, etched photoresist coating, and etched si containing layer(s), and manufacturing a device using thereof

Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

Shunji Kawato, Kakegawa, JP;

Hiroshi Yanagita, Kakegawa, JP;

Yusuke Hama, Kakegawa, JP;

Takayuki Sao, Kakegawa, JP;

Taku Hirayama, Tokyo, JP;

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:

Faegre Drinker Biddle & Reath LLP

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08G 65/08 (2006.01); C08G 65/329 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/36 (2006.01); G03F 7/40 (2006.01); H10P 50/28 (2026.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); G03F 7/0045 (2013.01); G03F 7/0752 (2013.01); G03F 7/094 (2013.01); G03F 7/20 (2013.01); G03F 7/40 (2013.01); G03F 7/70025 (2013.01); H10P 50/28 (2026.01); C08G 65/08 (2013.01); C08G 65/329 (2013.01);
Abstract

The present invention relates to a photoresist composition comprising a polymer(s), a photo acid generator(s), a (C) compound(s) comprising unit EO and unit PO, and a solvent(s). And the present invention relates to a method for manufacturing a photoresist coating, etched photoresist coating, and etched Si containing layer(s). And the present invention relates to a method for a a manufacturing a device.

Find Patent Forward Citations

Kawato, Shunji. (2026). Photoresist composition, a method for manufacturing a photoresist coating, etched photoresist coating, and etched si containing layer(s), and manufacturing a device using thereof (U.S. Patent No. 12645142). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12645142

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…