The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2026
Filed:
Jun. 17, 2019
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
Shunji Kawato, Kakegawa, JP;
Hiroshi Yanagita, Kakegawa, JP;
Yusuke Hama, Kakegawa, JP;
Takayuki Sao, Kakegawa, JP;
Taku Hirayama, Tokyo, JP;
Assignee:
Merck Patent GmbH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08G 65/08 (2006.01); C08G 65/329 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/36 (2006.01); G03F 7/40 (2006.01); H10P 50/28 (2026.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); G03F 7/0045 (2013.01); G03F 7/0752 (2013.01); G03F 7/094 (2013.01); G03F 7/20 (2013.01); G03F 7/40 (2013.01); G03F 7/70025 (2013.01); H10P 50/28 (2026.01); C08G 65/08 (2013.01); C08G 65/329 (2013.01);
Abstract
The present invention relates to a photoresist composition comprising a polymer(s), a photo acid generator(s), a (C) compound(s) comprising unit EO and unit PO, and a solvent(s). And the present invention relates to a method for manufacturing a photoresist coating, etched photoresist coating, and etched Si containing layer(s). And the present invention relates to a method for a a manufacturing a device.