The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2026
Filed:
May. 24, 2023
Samsung Sdi Co., Ltd., Yongin-si, KR;
Changsoo Woo, Suwon-si, KR;
Seung Han, Suwon-si, KR;
Seungyong Chae, Suwon-si, KR;
Minyoung Lee, Suwon-si, KR;
Jimin Kim, Suwon-si, KR;
Sumin Jang, Suwon-si, KR;
Sangkyun Im, Suwon-si, KR;
Yaeun Seo, Suwon-si, KR;
Eunmi Kang, Suwon-si, KR;
Soobin Lim, Suwon-si, KR;
Kyungsoo Moon, Suwon-si, KR;
Samsung SDI Co., Ltd., Yongin-si, KR;
Abstract
A semiconductor photoresist composition and a method of forming patterns utilizing the semiconductor photoresist composition are disclosed. The semiconductor photoresist composition may include a first organometallic compound represented by Chemical Formula 1, a second organometallic compound represented by Chemical Formula 2, and a solvent, where the first organometallic compound is different from the second organometallic compound, at least one selected from among Rand Lmay include a tertiary carbon, and at least one selected from among Rand Lmay include at least one selected from among a primary carbon and a secondary carbon.