The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2026

Filed:

Jun. 08, 2022
Applicant:

Johnson & Johnson Vision Care, Inc., Jacksonville, FL (US);

Inventors:

Edward R. Kernick, Jacksonville, FL (US);

Peter Cerreta, Jacksonville, FL (US);

Assignee:

Johnson & Johnson Vision Care, Inc., Jacksonville, FL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02C 13/00 (2006.01); G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
G02C 13/003 (2013.01); G05B 19/41875 (2013.01); G05B 2219/32368 (2013.01); G05B 2219/33034 (2013.01);
Abstract

Disclosed herein are methods for quality control of contact lenses. An example method comprises receiving an input image indicative of a subject contact lens. The example method comprises outputting, based on analysis of the input image and using a first learning model, a first foreign matter metric and rejection data based on the analysis of the input image. The example method comprises outputting, using an artifact model and based on at least the rejection data, an artifact metric. The artifact model may be implemented based on one or more artifact attributes. The example method comprises outputting, using a second learning model and based at least on the first foreign matter metric and the artifact metric, a second foreign matter metric. The second learning model may be scale dependent. The second foreign matter metric is indicative of at least an accept or reject condition of the subject contact lens.


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