The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2026
Filed:
Sep. 29, 2023
Fujifilm Corporation, Tokyo, JP;
Takashi Yonemoto, Minamiashigara, JP;
Hiroshi Sato, Minamiashigara, JP;
Yukito Saitoh, Minamiashigara, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided are a beam combiner that can obtain a fine and clear interference pattern, a method of forming an alignment film in which a fine and clear alignment pattern can be obtained, and a method of manufacturing an optical element including a fine and clear liquid crystal alignment pattern. The beam combiner includes: a beam combiner element that emits light where light transmitted through a first surface and light reflected from a second surface are combined; a light control element that is provided on an upstream side of the beam combiner; and a polarization conversion layer that converts polarized light of the light emitted from the beam combiner element, in which an absolute value of an ellipticity of light emitted from the polarization conversion layer is 0.7 or more.