The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2026

Filed:

Sep. 01, 2023
Applicant:

Milaebo Co., Ltd., Pyeongtaek-si, KR;

Inventors:

Che Hoo Cho, Seoul, KR;

Yeon Ju Lee, Hwaseong-si, KR;

Ji Eun Han, Pyeongtaek-si, KR;

Sung Won Yoon, Siheung-si, KR;

Assignee:

MILAEBO CO., LTD., Pyeongtaek-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); F23J 15/02 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); C23C 16/4411 (2013.01); F23J 15/022 (2013.01); H10P 72/0402 (2026.01);
Abstract

The present disclosure relates to an apparatus for collecting reaction by-products for semiconductor processes through pyrolysis in a high-temperature region and an oxidation reaction in a low-temperature region, and an object of the present disclosure is to provide an apparatus for collecting reaction by-products, which is capable of collecting powdered oxides grown from High K materials by inducing an oxidation reaction in a box-shaped collection part having a low-temperature region formed by a cooling pad part after thermally decomposing the High K material at a high temperature of a heater in an inlet port of the collection apparatus when High K deposition precursors, which are supplied to a process chamber for an oxidation process for depositing a semiconductor dielectric film with the High K material having high permittivity in order to miniaturize a semiconductor circuit, are discharged together with exhaust gas.


Find Patent Forward Citations

Cho, Che. (2026). Apparatus for collecting reaction by-products for semiconductor processes through pyrolysis in the high temperature region and oxidation reaction in the low temperature region (U.S. Patent No. 12644179). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12644179

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…