The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2026
Filed:
May. 02, 2024
Applicant:
Battelle Savannah River Alliance, Llc, Aiken, SC (US);
Inventor:
Donald W. Benza, Aiken, SC (US);
Assignee:
Battelle Savannah River Alliance, LLC, Aiken, SC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/40 (2017.01); B29C 64/106 (2017.01); B29C 64/336 (2017.01); B29C 64/371 (2017.01); B33Y 10/00 (2015.01); B33Y 70/00 (2020.01);
U.S. Cl.
CPC ...
B29C 64/40 (2017.08); B29C 64/106 (2017.08); B29C 64/336 (2017.08); B29C 64/371 (2017.08); B33Y 10/00 (2014.12); B33Y 70/00 (2014.12);
Abstract
Described are additive manufacturing methods and systems that can deposit an occluding material in the form of a 'cocoon' over previously deposited build material. The occluding material protects previously deposited layers from overexposure to the local environment and can allow exposure times of build material to be better controlled. The occluding material is removed following formation of the build product.
Benza, Donald. (2026). Method of controlling local environment exposure during additive manufacturing (U.S. Patent No. 12643294). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12643294
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile