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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12643266 B1

PDFFull Text
Date of Patent:
Jun. 02, 2026

Filed:

Jun. 25, 2024

Substrate processing apparatus, substrate processing method, and article manufacturing method

Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Hiroki Takada, Saitama, JP;

Ken-Ichiro Shinoda, Tochigi, JP;

Osamu Yasunobe, Tochigi, JP;

Assignee:

CANON KABUSHIKI KAISHA, Tokyo, JP;

Attorney:

ROSSI, KIMMS & McDOWELL LLP

Primary Examiner:

Philip C Tucker

Assistant Examiner:

Jimmy R Smith, Jr.

Int. Cl.
CPC ...
B29C 35/08 (2006.01); B29C 35/02 (2006.01); B29C 41/20 (2006.01); B29C 41/46 (2006.01); B29C 41/52 (2006.01); B29L 31/34 (2006.01);
U.S. Cl.
CPC ...
B29C 35/0288 (2013.01); B29C 35/0805 (2013.01); B29C 41/20 (2013.01); B29C 41/46 (2013.01); B29C 41/52 (2013.01); B29C 2035/0827 (2013.01); B29L 2031/3425 (2013.01);
Abstract

A substrate processing apparatus that can radiate light on a composition in an optimum radiation amount based on acquired spectral sensitivity characteristics can be provided. A substrate processing apparatus configured to perform pattern formation processing on a composition on a substrate includes a first radiation unit configured to radiate first light onto the substrate, a dispenser configured to apply the composition to a first position inside the substrate processing apparatus, a template holding unit configured to hold a template to be brought in contact with the composition on the substrate, and a controller configured to control a radiation amount of the first light to be radiated by the first radiation unit based on spectral sensitivity characteristics of the composition that are measured in advance.

Find Patent Forward Citations

Takada, Hiroki. (2026). Substrate processing apparatus, substrate processing method, and article manufacturing method (U.S. Patent No. 12643266). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12643266

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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