The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2026
Filed:
Oct. 19, 2022
Bard Access Systems, Inc., Salt Lake City, UT (US);
Juan Sepulveda, Centerville, UT (US);
Glade H. Howell, Draper, UT (US);
Bard Access Systems, Inc., Salt Lake City, UT (US);
Abstract
The distal tip structure of a rapidly insertable central catheter (RICC) can be required to perform different functions from that of the remaining, multi-luminal section, of the RICC catheter. As such, the catheter body can be formed of a first material and the distal tip structure can be formed of a second material. Forming the RICC requires joining these two materials while maintaining a smooth abluminal surface. A bifurcated plug including a second material can be placed within a first lumen or second lumen of the catheter body. A mandrel can be placed within a third lumen. The assembly can then be placed within a die to plastically deform the bifurcated plug into a distal tip structure. Advantageously, only a single structure is required to plug the lumen and form the distal tip structure, reducing complexity and associated costs.