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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12642024 B1

PDFFull Text
Date of Patent:
May. 26, 2026

Filed:

Jul. 14, 2021

Plasma processing method

Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Tatsuya Hayashi, Tokyo, JP;

Tomoyoshi Ichimaru, Tokyo, JP;

Mineaki Kodama, Tokyo, JP;

Masashi Kawabata, Tokyo, JP;

Yujiro Yoneda, Tokyo, JP;

Assignee:

HITACHI HIGH-TECH CORPORATION, Tokyo, JP;

Attorney:

Miles & Stockbridge, P.C.

Primary Examiner:

Stephanie P Duclair

Int. Cl.
CPC ...
H10P 50/26 (2026.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H10P 50/267 (2026.01); H01J 37/32146 (2013.01); H01J 2237/334 (2013.01);
Abstract

Provided is a plasma processing method capable of achieving flat etching process while suppressing vertical etching. The plasma processing method for plasma-etching a titanium nitride (TiN) film that forms a metal gate and contacts an insulating film on both sides includes the step of etching the titanium nitride (TiN) film by using plasmas that are generated by using a mixed gas of boron trichloride (BCl) gas, nitrogen (N) gas, and nitrogen trifluoride (NF) gas and are generated by radio-frequency power modulated by a pulse, wherein the pulse has a first period with a first amplitude as its amplitude and a second period with a second amplitude as its amplitude and wherein the second amplitude is greater than 0 and less than the first amplitude.

Find Patent Forward Citations

Hayashi, Tatsuya. (2026). Plasma processing method (U.S. Patent No. 12642024). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12642024

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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