The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2026
Filed:
Aug. 04, 2021
Korea Advanced Nano Fab Center, Gyeonggi-do, KR;
Hyeong Ho Park, Daejeon, KR;
Eunjeong Youn, Seoul, KR;
Hae-Yong Jeong, Gyeonggi-do, KR;
Sang Hyun Jung, Gyeonggi-do, KR;
Yu Min Ko, Gyeonggi-do, KR;
Chan Soo Shin, Gyeonggi-do, KR;
Shin Keun Kim, Gyeonggi-do, KR;
KOREA ADVANCED NANO FAB CENTER, Gyeonggi-do, KR;
Abstract
A structure including quantum dots formed in a surface control region, a method of forming a structure including quantum dots in a surface control region, a surface-controlled substrate provided with the structure including quantum dots, and a photoelectronic element using the same. The method includes forming multiple surface control layers that differ in etch resistance on a substrate, securing a surface control region on the substrate by forming control patterns having respectively different sizes in the respective surface control layers depending on the etch resistance values through an exposure process, forming the structure including quantum dots in the surface control region by using the plurality of surface control layers as masks, and removing the surface control layers.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile