The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2026

Filed:

Jan. 16, 2023
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Sangmin Kang, Suwon-si, KR;

Bio Kim, Seoul, KR;

Hyung Joon Kim, Pyeongtaek-si, KR;

Kyungwook Park, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10B 43/27 (2023.01); H10B 43/10 (2023.01); H10B 43/35 (2023.01); H10B 43/40 (2023.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02); H10B 43/10 (2023.02); H10B 43/35 (2023.02); H10B 43/40 (2023.02);
Abstract

Disclosed are 3D semiconductor memory devices and electronic systems including the same. The 3D semiconductor memory device comprises a stack structure including interlayer dielectric layers and gate electrodes that are alternately and repeatedly stacked on a substrate, vertical channel structures in vertical channel holes that penetrate the stack structure and each including a charge storage layer, a tunneling dielectric layer, and a vertical semiconductor pattern that are sequentially cover an inner sidewall of each of the vertical channel holes, and a diffusion stop layer between the gate electrodes and the charge storage layer. The diffusion stop layer includes a dielectric material having a dielectric constant of greater than about 0 and less than about 5.


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