The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2026

Filed:

Nov. 20, 2023
Applicant:

Shaanxi Startorus Fusion Technology Company Limited, Xi'an, CN;

Inventors:

Yi Tan, Xi'an, CN;

Rui Chen, Xi'an, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); H05H 1/10 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
H05H 1/10 (2013.01); G03F 7/70033 (2013.01); H05H 1/4645 (2021.05);
Abstract

A method for generating an extreme ultraviolet light, an extreme ultraviolet light source assembly, and an optical system are provided. With the method for generating an extreme ultraviolet light, a plasma is generated by a magnetic confinement device, if the plasma meets a preset injection condition, a heavy metal injection device is controlled to inject a designated heavy metal into the magnetic confinement device, so that the designated heavy metal interacts with the plasma in the magnetic confinement device to generate an extreme ultraviolet light, and an optical device is controlled to collect the extreme ultraviolet light.


Find Patent Forward Citations

Tan, Yi. (2026). Method for generating extreme ultraviolet light, extreme ultraviolet light source assembly and optical system (U.S. Patent No. 12641704). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12641704

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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