The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2026
Filed:
Mar. 10, 2022
Applicant:
V Technology Co., Ltd., Kanagawa, JP;
Inventor:
Michinobu Mizumura, Kanagawa, JP;
Assignee:
V TECHNOLOGY CO., LTD., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/16 (2006.01); H01J 37/09 (2006.01); H01J 37/244 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/16 (2013.01); H01J 37/09 (2013.01); H01J 37/244 (2013.01); H01J 37/3174 (2013.01); H01J 2237/166 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/31749 (2013.01);
Abstract
A focused ion beam system includes a beam emitter and an aperture. The beam emitter is equipped with a focused ion beam optical system which works to control an ion beam, as produced by an ion source, and emit the ion beam into an inner space. The aperture communicates with the inner space to permit the ion beam, as emitted from the beam emitter, to pass therethrough, thereby having a target substrate exposed to the ion beam. The inner space is evacuated in a vacuum. A movable sealing valve is provided which selectively opens or closes the aperture.