The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2026

Filed:

Oct. 31, 2022
Applicants:

Chongqing Boe Optoelectronics Technology Co., Ltd., Chongqing, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Bin Wan, Beijing, CN;

Xiaoyuan Wang, Beijing, CN;

Hui Guo, Beijing, CN;

Chen Xu, Beijing, CN;

Guodong Yang, Beijing, CN;

Junming Chen, Beijing, CN;

Yan Liu, Beijing, CN;

Xun Pu, Beijing, CN;

Yuanyuan Zhu, Beijing, CN;

Zhongshan Wu, Beijing, CN;

Dan Lei, Beijing, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1339 (2006.01); G02F 1/1333 (2006.01); G02F 1/1345 (2006.01); G09G 3/36 (2006.01);
U.S. Cl.
CPC ...
G02F 1/1339 (2013.01); G02F 1/133357 (2021.01); G02F 1/1345 (2013.01); G09G 3/3648 (2013.01);
Abstract

A display substrate is provided to include: a first base substrate including a sealing region and a display port region, wherein at least one first connection region and at least one second connection region are in the display port region, a first overlapping region is formed between the second and first connection regions; first and second connection terminals in the first and second connection regions, respectively; and a planarization layer including at least one first trench and at least one second trench corresponding to the first and second connection regions therein, respectively; orthographic projections of bottoms of first and second trenches on the first base substrate cover corresponding first and second connection regions, respectively; the planarization layer includes: a first pattern corresponding to the first overlapping region; orthographic projections of the first pattern and its corresponding first overlapping region on the first base substrate overlap with each other.


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