The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2026

Filed:

Jun. 30, 2022
Applicants:

Hefei Xinsheng Optoelectronics Technology Co., Ltd., Hefei, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Quan Gan, Beijing, CN;

Ran Zhang, Beijing, CN;

Yongcan Wang, Beijing, CN;

Mingfei Zhang, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1337 (2006.01); G02F 1/1362 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133707 (2013.01); G02F 1/136222 (2021.01); G02F 1/136286 (2013.01);
Abstract

An array substrate (ARR) includes a base substrate (BP), a first electrode layer (EDLA), an insulating layer (PVX) and a second electrode layer (EDLB) stacked in sequence; where one of the first electrode layer (EDLA) and the second electrode layer (EDLB) is provided with a slit electrode (SLD); the array substrate (ARR) further includes a plurality of data lines (DataL), and a part of the data lines (DataL) adjacent to the slit electrode (SLD) extends linearly along a column direction (DV); the slit electrode (SLD) is provided with a plurality of slits (SL), the slits (SL) include a first slit section (SLA), and an angle between an extending direction of the first slit section (SLA) and a row direction (DH) is in a range of 69° to 85°.


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