The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2026
Filed:
Aug. 28, 2023
Modulight Corporation, Tampere, FI;
Timo Aho, Tampere, FI;
Mika Mähönen, Tampere, FI;
Modulight Corporation, Tampere, FI;
Abstract
Disclosed is a method for fabricating high-aspect-ratio gratings that includes providing a semiconductor substrate. The method further includes depositing a first layer of a first silicon-based material on the semiconductor substrate; depositing a second layer of a second silicon-based material on the first layer; and depositing a third layer of a resist material on the second layer. The method further includes forming a pattern in the third layer by exposing the resist material. The method further includes transferring the pattern from the third layer into the second layer by etching; and transferring the pattern from the second layer into the first layer by etching, using the patterned second layer as a first mask layer. The method further includes forming a grating into the semiconductor substrate by etching, using the patterned first layer as a second mask layer.