The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2026

Filed:

Jul. 18, 2022
Applicant:

Scantinel Photonics Gmbh, Ulm, DE;

Inventors:

Vladan Blahnik, Oberkochen, DE;

Holger Münz, Aalen, DE;

Martin Peschka, Aalen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01S 7/481 (2006.01); G01S 17/32 (2020.01); G01S 17/48 (2006.01); G01S 17/89 (2020.01); G01S 17/931 (2020.01); G02B 6/32 (2006.01); G02B 6/42 (2006.01);
U.S. Cl.
CPC ...
G01S 7/4815 (2013.01); G01S 7/4817 (2013.01); G01S 17/32 (2013.01); G01S 17/48 (2013.01); G01S 17/89 (2013.01); G02B 6/32 (2013.01); G02B 6/4206 (2013.01); G01S 17/931 (2020.01);
Abstract

A LiDAR device () for scanning measurement of a distance to an object () comprises a photonic integrated circuit () with a plurality of optical waveguides () and a plurality of couplers). Each coupler () emits light guided in the optical waveguide () into free space and/or couples light propagating in free space into the optical waveguide (). A collimating optical system () collimates light beams emitted by the couplers () and/or focuses collimated light beams. Microlenses () form real or virtual images of associated couplers (), said images being arranged in an object field () of the collimating optical system (). The collimating optical system () has a collimator numerical aperture which is greater than each of the coupler numerical apertures. Each microlens () has a collimator-side numerical aperture that is greater than its coupler-side numerical aperture. In this manner, insertion losses caused by NA mismatch are reduced.


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