The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2026

Filed:

Jul. 18, 2019
Applicant:

Deka Products Limited Partnership, Manchester, NH (US);

Inventors:

Lauren N. Shum, Manchester, NH (US);

David Blumberg, Jr., Deerfield, NH (US);

Assignee:

DEKA Products Limited Partneship, Manchester, NH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 5/053 (2021.01); C12M 1/34 (2006.01); C12M 1/36 (2006.01); H01Q 7/04 (2006.01); A61B 5/06 (2006.01); A61N 1/36 (2006.01);
U.S. Cl.
CPC ...
C12M 41/32 (2013.01); C12M 41/36 (2013.01); C12M 41/48 (2013.01); H01Q 7/04 (2013.01); A61B 5/063 (2013.01); A61N 1/3614 (2017.08);
Abstract

System and method for monitoring material change by measuring at least one metric. In a first configuration, an EM signal is transmitted across a calibrated transmission configuration to at least one load including the material, the reflection is measured, and the at least one metric is calculated based at least on the reflection. In a second configuration, an EM signal is transmitted in the vicinity of at least one resonator that is operably coupled with a load that can include the material. An EM signal is received that has been affected by the resonator, and a measurement of the at least one metric can be based at least on the received signal.


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