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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12636612 B1

PDFFull Text
Date of Patent:
May. 26, 2026

Filed:

Aug. 07, 2023

Gas treatment system, semiconductor process system including the same, and gas treatment method using the same

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Wonsu Lee, Suwon-si, KR;

Hyunseok Kim, Suwon-si, KR;

Jungdae Park, Suwon-si, KR;

Kimoon Lee, Suwon-si, KR;

Jong-San Chang, Suwon-si, KR;

Assignee:

SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Sharon Pregler

Int. Cl.
CPC ...
B01D 53/88 (2006.01); B01D 53/86 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
B01D 53/885 (2013.01); B01D 53/869 (2013.01); H10P 72/0421 (2026.01); B01D 2255/9032 (2013.01); B01D 2258/0216 (2013.01);
Abstract

A gas treatment system includes a first scrubber configured to treat a gas exhausted from a process chamber, a catalytic reactor connected to the first scrubber and configured to treat a gas passing through the first scrubber, and a second scrubber connected to the catalytic reactor and configured to treat a gas passing through the catalytic reactor, where the catalytic reactor includes a fluidized bed reactor (FBR).

Find Patent Forward Citations

Lee, Wonsu. (2026). Gas treatment system, semiconductor process system including the same, and gas treatment method using the same (U.S. Patent No. 12636612). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12636612

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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