The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2026
Filed:
Apr. 20, 2023
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Andrea Leoncini, Singapore, SG;
Zhijie Chua, Singapore, SG;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 5/00 (2006.01); B01D 8/00 (2006.01); B01D 53/00 (2006.01); B01D 53/75 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
B01D 5/0036 (2013.01); B01D 8/00 (2013.01); B01D 53/002 (2013.01); B01D 53/75 (2013.01); B01D 2221/14 (2013.01); B01D 2257/108 (2013.01); B01D 2257/11 (2013.01); B01D 2258/0216 (2013.01); C23C 16/4412 (2013.01); Y10S 55/15 (2013.01);
Abstract
Chemical precursor recovery systems and methods of recovering and reusing semiconductor manufacturing chemistry are disclosed. The recovery systems include a cold trap inlet line in fluid communication with a plurality of cold traps and a cold trap outlet line. The plurality of cold traps is configured to condense the chemical precursors and are arranged based on semiconductor manufacturing process conditions.