The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Dec. 20, 2022
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Yong Hyun Choi, Cheonan-si, KR;

Young Hun Lee, Cheonan-si, KR;

Yong Joon Im, Yongin-si, KR;

Seung Hoon Oh, Cheonan-si, KR;

Tae Jong Choi, Anyang-si, KR;

Yong Sun Ko, Suwon-si, KR;

Sang Min Lee, Seoul, KR;

Jin Woo Jung, Cheonan-si, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10P 72/00 (2026.01); B08B 13/00 (2006.01); H10P 72/76 (2026.01); B25J 11/00 (2006.01); H10P 72/30 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0406 (2026.01); B08B 13/00 (2013.01); H10P 72/0414 (2026.01); H10P 72/0456 (2026.01); H10P 72/7602 (2026.01); B25J 11/0095 (2013.01); H10P 72/3302 (2026.01);
Abstract

Disclosed is an apparatus for treating a substrate. The apparatus for treating the substrate includes a liquid treating chamber for liquid-treating the substrate by supplying a treatment liquid to the substrate, a drying chamber for drying the substrate by supplying a process fluid to the substrate, a transfer unit for transferring the substrate between the liquid treating chamber and the drying chamber, and a rear surface cleaning unit for cleaning a rear surface of the substrate, in which the rear surface cleaning unit may clean the rear surface of the substrate while transferring the substrate from the liquid treating chamber to the drying chamber.


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