The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
May. 26, 2022
Applicant:
Screen Holdings Co., Ltd., Kyoto, JP;
Inventor:
Dai Ueda, Kyoto, JP;
Assignee:
SCREEN Holdings Co., Ltd., Kyoto, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3213 (2006.01); H10P 50/66 (2026.01);
U.S. Cl.
CPC ...
H10P 50/667 (2026.01);
Abstract
This disclosure relates to a substrate treating method and a substrate treating apparatus. The substrate treating method for treating a substrate W includes a switching step and a processing step. In the switching step, an additive agent is switched between an anion surfactant and a cation surfactant. In the processing step, an etching solution is supplied to the substrate W. In the processing step, the additive agent selected in the switching step is supplied to the substrate W.
Ueda, Dai. (2026). Substrate treating method and substrate treating apparatus (U.S. Patent No. 12635432). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12635432
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile