The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Dec. 21, 2022
Applicant:

Analog Devices, Inc., Wilmington, MA (US);

Inventors:

James G. Fiorenza, Carlisle, MA (US);

Guanghai Ding, Bedford, MA (US);

Daniel Piedra, Somerville, MA (US);

Assignee:

Analog Devices, Inc., Wilmington, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/01 (2025.01); H10D 30/47 (2025.01); H10D 62/824 (2025.01); H10D 62/832 (2025.01); H10D 62/85 (2025.01); H10D 64/00 (2025.01); H10P 30/20 (2026.01);
U.S. Cl.
CPC ...
H10D 30/015 (2025.01); H10D 30/475 (2025.01); H10D 62/824 (2025.01); H10D 62/8325 (2025.01); H10D 62/8503 (2025.01); H10D 64/111 (2025.01); H10P 30/2042 (2026.01); H10P 30/21 (2026.01);
Abstract

Techniques to increase the number of current paths (or 'channels') in a GaN transistor, without increasing the device area, thereby decreasing the on-resistance. In addition, this disclosure describes techniques to utilize back-side field management to improve the device's performance. For example, the techniques can include using p-type implantation into the substrate, e.g., silicon carbide (SiC), as a field management tool to form a superjunction device, thereby increasing the effective field and reducing the on-resistance multiplied by the output charge (Qoss).


Find Patent Forward Citations

Loading…