The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Mar. 27, 2025
Applicant:

Good Chemistry Inc., Tarrytown, NY (US);

Inventors:

Kevin Ryczko, Gatineau, CA;

Amit Kadan, Vancouver, CA;

Takeshi Yamazaki, Vancouver, CA;

Assignee:

Good Chemistry Inc., Vancouver, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 33/48 (2006.01); G01N 33/50 (2006.01); G16C 20/40 (2019.01); G16C 20/50 (2019.01); G16C 20/70 (2019.01);
U.S. Cl.
CPC ...
G16C 20/50 (2019.02); G16C 20/40 (2019.02); G16C 20/70 (2019.02);
Abstract

A method for machine learning aided modeling of two interacting structures may include: (a) receiving an input structure comprising an interaction region; (b) generating a plurality of candidate structures using a first differentiable machine learning model; (c) docking one or more candidate structures of the plurality of candidate structures at the interaction region of the input structure using a second differentiable machine learning model to predict a docking geometry; (d) ranking the one or more candidate structures of the plurality of candidate structures docked in (c) using a third differentiable machine learning model to predict a score; and (e) backpropagating the score to (i) the first differentiable machine learning model to update the plurality of candidate structures or (ii) the second differentiable machine learning model to update the docking geometry.


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