The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Feb. 02, 2024
Applicant:

Ecopia Tech Corporation, Toronto, CA;

Inventors:

Yuanming Shu, Toronto, CA;

Shuo Tan, Campbell, CA (US);

Dawei Zai, Toronto, CA;

Tuan Zhao, Toronto, CA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 17/05 (2011.01); G06T 7/13 (2017.01); G06T 17/00 (2006.01); G06V 20/70 (2022.01); H04N 13/351 (2018.01);
U.S. Cl.
CPC ...
G06T 17/00 (2013.01); G06T 7/13 (2017.01); G06T 17/05 (2013.01); G06V 20/70 (2022.01); H04N 13/351 (2018.05);
Abstract

Methods and systems for generating geometric models of buildings from multiview imagery are provided. An example method involves displaying at least a first image and a second image that depict the building from different points of view, providing functionality for a user to annotate, with reference to at least the first image and the second image, a three-dimensional structure of a first building section of the building having a polygonal outline of a first substantially horizontal roof structure situated at a first height, and a three-dimensional structure of a second building section of the building having a polygonal outline of a second substantially horizontal roof structure situated at a second height lower than the first height. The polygonal outline of the second substantially horizontal roof structure is annotated by selecting a point located directly on one of the side walls of the first building section.


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