The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
May. 06, 2024
Optimized over-rendering and edge-aware smooth spatial gain map to suppress frame boundary artifacts
Qualcomm Incorporated, San Diego, CA (US);
Mahdi Shaghaghi, San Diego, CA (US);
Cullum James Baldwin, San Diego, CA (US);
Dam Backer, San Diego, CA (US);
QUALCOMM Incorporated, San Diego, CA (US);
Abstract
Techniques and systems are provided for image processing. For instance, a process can include: receiving an initial image rendered at a first time interval, the initial image having a larger field of view as compared to a field of view of a display; generating a mesh of vertices for the initial image, at least one vertex of the mesh corresponding to a portion of the initial image with the larger field of view; reprojecting the mesh of vertices based on a view angle change since the first time interval to obtain a reprojected mesh; generating estimated distortion information for the at least one vertex of the reprojected mesh corresponding to a portion of the initial image with the larger field of view; pre-distorting the reprojected mesh based on the estimated distortion information; and rasterizing the initial image based on the pre-distorted reprojected mesh to generate a reprojected image.