The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Dec. 14, 2022
Applicant:

Fujitsu Limited, Kawasaki, JP;

Inventors:

Tomokazu Nomura, Odawara, JP;

Hideaki Katagiri, Fujisawa, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/347 (2020.01);
U.S. Cl.
CPC ...
G06F 30/347 (2020.01);
Abstract

A processing unit reads out design information about a highest hierarchical layer from a storage unit, divides the highest hierarchical layer into a plurality of segments (segments, etc.) based on the design information about the highest hierarchical layer, detects overlapping areas (optimum placement areas) in which segments at a corresponding location among a plurality of instances in a lowest hierarchical layer included in the highest hierarchical layer overlap with each other at least partly when the plurality of instances are overlapped with each other, sets, in each of the overlapping areas in the plurality of instances, a temporary placement location in which a test cell used for testing of manufacturing variation in critical dimension is temporarily placed, and outputs information indicating the overlapping areas and the temporary placement locations.


Find Patent Forward Citations

Nomura, Tomokazu. (2026). Method and design apparatus (U.S. Patent No. 12632633). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12632633

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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