The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Sep. 18, 2023
Applicant:

Fujifilm Business Innovation Corp., Tokyo, JP;

Inventors:

Kota Nohara, Kanagawa, JP;

Sakae Takeuchi, Kanagawa, JP;

Yuka Zenitani, Kanagawa, JP;

Hajime Sugahara, Kanagawa, JP;

Mai Mochida, Kanagawa, JP;

Mieko Seki, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 9/097 (2006.01); G03G 15/02 (2006.01); G03G 15/08 (2006.01); G03G 15/16 (2006.01); G03G 15/20 (2006.01); C01B 33/18 (2006.01);
U.S. Cl.
CPC ...
G03G 9/09725 (2013.01); G03G 15/0216 (2013.01); G03G 15/0868 (2013.01); G03G 15/1605 (2013.01); G03G 15/2092 (2013.01); C01B 33/18 (2013.01); C01P 2006/16 (2013.01); G03G 2215/066 (2013.01);
Abstract

A silica particle contains a nitrogen-containing compound, α/β is 0.30 or greater and 0.80 or less, where α and β are the BET specific surface areas of the silica particle before and after baking at 350° C., respectively, and the absolute ratio of the triboelectric series of the silica particle before baking at 350° C. to that of the silica particle after baking at 350° C. is 0.10 or greater and 0.85 or less.


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