The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Apr. 29, 2022
Samsung Sdi Co., Ltd., Yongin-si, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Ran Namgung, Suwon-si, KR;
Shinhyo Bae, Suwon-si, KR;
Hyeon Park, Suwon-si, KR;
Daeseok Song, Suwon-si, KR;
Minki Chon, Suwon-si, KR;
Jun Soo Kim, Hwaseong-si, KR;
Hyun-Woo Kim, Seongnam-si, KR;
Hyun-Ji Song, Anyang-si, KR;
Young Joo Choi, Hwaseong-si, KR;
Suk-Koo Hong, Hwaseong-si, KR;
Samsung SDI Co., Ltd., Yongin-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A method of forming a photoresist pattern and a semiconductor device on which a photoresist pattern manufactured according to the same is formed. The method includes forming a photoresist pattern on a substrate; coating an organic topcoat composition including an acrylic polymer including a structural unit containing a hydroxy group and a fluorine and an acidic compound on the photoresist pattern; drying and heating the substrate on which the organic topcoat composition is coated to coat it with a topcoat; and spraying a rinse solution including an ether-based compound on the substrate coated with the topcoat to remove the topcoat.