The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Mar. 12, 2020
Applicant:

Nissan Chemical Corporation, Tokyo, JP;

Inventors:

Hikaru Tokunaga, Toyama, JP;

Hiroto Ogata, Toyama, JP;

Tomotada Hirohara, Toyama, JP;

Makoto Nakajima, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); G03F 7/0045 (2013.01); G03F 7/2004 (2013.01); G03F 7/38 (2013.01); G03F 7/11 (2013.01); G03F 7/26 (2013.01);
Abstract

A composition for forming a resist underlayer film includes: (A) a cross-linking compound that is represented by formula (I); and (D) a solvent. [In formula (I), m is an integer from 1 to 30, T is a single bond, a saturated hydrocarbon group, an aromatic group, or an unsaturated cyclic hydrocarbon group, G, G, G, G, G, and Gare each independently (i) or (ii), the n's are each independently an integer from 1 to 8, the n R's are each independently a hydrogen atom, an aliphatic hydrocarbon group, or an alicyclic hydrocarbon group, the A's are each independently an aryl group that may be interrupted by an alkylene group, and Z, Z, Z, Z, Z, and Zare each independently an alkyl group, an aryl group, a hydroxy group, an epoxy group, or a hydrogen atom.]


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