The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Oct. 05, 2022
Samsung Electronics Co., Ltd., Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A method of correcting an error of a layout of a pattern includes: designing a layout of a target pattern; checking an error between the layout of the target pattern and a layout of a real pattern in a photomask manufactured based on the layout of the target pattern; generating EPE vectors at a plurality of points, respectively, in a contour of the layout of the target pattern; calculating horizontal and vertical elements in horizontal and vertical directions, respectively, of each of the generated EPE vectors; calculating an offset representative value of the layout of the target pattern at each direction based on the calculated horizontal and vertical elements of the EPE vectors; and correcting the layout of the target pattern based on the offset representative value.