The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Sep. 26, 2023
United States of America As Represented BY the Administrator of Nasa, Washington, DC (US);
Manuel A. Quijada, Laurel, MD (US);
Javier Del Hoyo, Pasadena, CA (US);
Luis Rodriguez De Marcos, Washington, DC (US);
Edward J. Wollack, Clarksville, MD (US);
Vivek H. Dwivedi, Glenn Dale, MD (US);
United States of America as represented by the Adminisrator of NASA, Washington, DC (US);
Abstract
A passivated reflective laminate is formed by positioning a substrate in a first reaction chamber; placing the first reaction chamber under vacuum with the substrate therein; depositing an aluminum layer on the substrate while maintaining the vacuum; exposing the aluminum layer to XeFgas to form an AlFlayer on the aluminum layer while maintaining the vacuum; and breaking the vacuum to obtain the passivated reflective laminate. The AlFlayer is a surface layer on the passivated reflective laminate. The passivated reflective laminate may optionally be positioned in a second reaction chamber, and the second reaction chamber may be placed under vacuum with the passivated reflective laminate therein. In the second reaction chamber, a dielectric layer is deposited on the passivated reflective laminate; and the vacuum is broken to allow removal of the passivated reflective laminate from the second reactor. The dielectric layer on the passivated reflective laminate is a surface layer covering the AlFlayer.