The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Apr. 20, 2022
Applicants:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Research & Business Foundation Sungkyunkwan University, Gyeonggi-do, KR;

Inventors:

Jeongyub Lee, Yongin-si, KR;

Geunyoung Yeom, Seoul, KR;

Heeju Kim, Suwon-si, KR;

Jongwoo Hong, Suwon-si, KR;

Yeonhee Kim, Seoul, KR;

Kideok Bae, Yongin-si, KR;

Haesoo Bae, Suwon-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 1/00 (2006.01); G02B 5/18 (2006.01); G03F 1/80 (2012.01);
U.S. Cl.
CPC ...
G02B 1/002 (2013.01); G02B 5/1809 (2013.01); G03F 1/80 (2013.01); G02B 2207/101 (2013.01);
Abstract

A meta-optical device and a method of manufacturing a metasurface are provided. The meta-optical device includes a substrate and a nanostructure, wherein the nanostructure includes a first portion and a second portion that differ in at least one of a diameter and a period, wherein a ratio of an etch depth of the second portion to an etch depth of the first portion is about 0.9 to about 1.1, and the nanostructure includes at least one of sulfur, fluorine, and fluorocarbon.


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