The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Oct. 17, 2022
Applicant:
Valeo Vision, Bobigny, FR;
Inventors:
Assignee:
Valeo Vision, Bobigny, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21S 43/40 (2018.01); B60Q 1/34 (2006.01); B60Q 1/38 (2006.01); B60Q 1/44 (2006.01); B60Q 1/46 (2006.01); B60Q 1/48 (2006.01); F21S 43/14 (2018.01); F21S 43/20 (2018.01); F21S 43/237 (2018.01); F21W 103/20 (2018.01); F21W 103/30 (2018.01); F21W 103/35 (2018.01); F21W 103/45 (2018.01); F21W 103/60 (2018.01);
U.S. Cl.
CPC ...
F21S 43/40 (2018.01); B60Q 1/34 (2013.01); B60Q 1/38 (2013.01); B60Q 1/381 (2022.05); B60Q 1/44 (2013.01); B60Q 1/46 (2013.01); B60Q 1/48 (2013.01); F21S 43/14 (2018.01); F21S 43/237 (2018.01); F21S 43/2621 (2024.05); F21W 2103/20 (2018.01); F21W 2103/30 (2018.01); F21W 2103/35 (2018.01); F21W 2103/45 (2018.01); F21W 2103/60 (2018.01);
Abstract
The invention relates to a system for projecting light beams for a vehicle, including a first device configured to generate a first beam which performs a signaling function and a second device configured to generate at least a second beam for projecting a pattern, with the first device including at least one refractive optical member for shaping the first beam and in that the second device includes at least one optical element having a controlled pattern-generating surface to deflect light rays from a light source, this generating surface having local variations arranged so as to form a predetermined pattern in the second beam.