The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Mar. 25, 2021
Applicant:

Lam Research Salzburg Gmbh, Salzburg-Gnigl, AT;

Inventors:

Herbert Ötzlinger, Hallwang, AT;

Marianne Kolitsch-Mataln, Villach, AT;

Harald Okorn-Schmidt, Klagenfurt, AT;

Andreas Gleissner, Döbriach, AT;

Assignee:

LAM RESEARCH SALZBURG GMBH, Salzburg-Gnigl, AT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 21/10 (2006.01); C25D 5/02 (2006.01); C25D 17/00 (2006.01);
U.S. Cl.
CPC ...
C25D 17/008 (2013.01); C25D 5/026 (2013.01); C25D 21/10 (2013.01);
Abstract

The invention relates to a shield body system for a process fluid for chemical and/or electrolytic surface treatment of a substrate, use of a shield body system, and a method for a chemical and/or electrolytic surface treatment of a substrate in a process fluid. The shield body system comprises a shield body and an agitation unit. The shield body has a plurality of openings to direct the process fluid flow and/or a current density distribution towards the substrate to be treated. The agitation unit is configured to move the shield body together with the substrate vertically and/or horizontally relative to a distribution body. Alternatively or additionally, the agitation unit is configured to move the shield body together with the substrate vertically and/or horizontally relative to a deposition chamber for chemical and/or electrolytic surface treatment.


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