The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Oct. 13, 2020
Lam Research Corporation, Fremont, CA (US);
Clint Edward Thomas, Newark, CA (US);
Jeremy Todd Tucker, Mountain View, CA (US);
Alan M. Schoepp, Ben Lomond, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A dual-plenum fractal (DPF) showerhead for distributing different semiconductor processing gases across a semiconductor wafer during processing operations is provided. The DPF showerhead may have a plurality of layers, each featuring a pattern of gas distribution features, with the gas distribution features on each layer generally being similar in shape to the gas distribution features on the layer immediately upstream therefrom but smaller in size. Such a 'fractal'-like structure to the gas flow passages provides very uniform processing gas delivery across the surface of a semiconductor wafer during processing operations, thereby enhancing wafer uniformity.