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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12630742 B1

PDFFull Text
Date of Patent:
May. 19, 2026

Filed:

Jun. 26, 2020

Polishing composition using polishing particles containing basic substance and having high water affinity

Applicant:

Nissan Chemical Corporation, Tokyo, JP;

Inventors:

Shigeru Mitsui, Funabashi, JP;

Eiichiro Ishimizu, Funabashi, JP;

Tohru Nishimura, Funabashi, JP;

Wataru Omori, Funabashi, JP;

Assignee:

NISSAN CHEMICAL CORPORATION, Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Amber R Orlando

Assistant Examiner:

Anastasia A. Kuvayskaya

Int. Cl.
CPC ...
C09G 1/02 (2006.01); H10P 52/00 (2026.01); H10P 52/40 (2026.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); H10P 52/00 (2026.01); H10P 52/403 (2026.01);
Abstract

A polishing composition that is for use in CMP polishing and that makes it possible to minimize the occurrence of defects. A polishing composition comprising silica particles, a basic nitrogen-containing organic compound, and water serving as a solvent, wherein the composition exhibits an Rsp value of the following Formula (1) of more than 0.7 and 6 or less as calculated from values measured by pulse NMR: Rsp=(Rav−Rb)/(Rb) . . . (1) (wherein Rsp is an index of water affinity; Rav is the reciprocal of the relaxation time of the polishing composition; and Rb is the reciprocal of the relaxation time of the water serving as a solvent of the polishing composition).

Find Patent Forward Citations

Mitsui, Shigeru. (2026). Polishing composition using polishing particles containing basic substance and having high water affinity (U.S. Patent No. 12630742). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12630742

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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